SPIE, the international society for optics and photonics, has announced the appointment of new co-editors-in-chief of the Journal of Micro/Nanolithography, MEMS, and MOEMS (JM3), effective January 1, 2020. Harry Levinson, a consultant at HJL Lithography, and Hans Zappe, the Gisela and Erwin Sick Professor of Micro-Optics at the University of Freiburg in Germany, will share editorial duties for the journal, published by SPIE. They succeed Chris Mack, who served as editor-in-chief of the journal since 2012.
JM3 publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors.
A long time associate editor of JM3, Zappe will manage the MEMS, MOEMS, and microfabrication side of the journal. Levinson, well known in the lithography community, will handle micro/nanolithography and related metrology technologies.
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